I’ll add some practice in the real world

The young man named Xiao Li was immediately in a hurry when he heard this. He hurriedly took out a portable air detection instrument from his backpack.

With a few beeps, the air detection instrument began to operate, and the nozzle on the instrument began to absorb the air in the filtered environment.

The working principle of this type of air detection instrument is to inhale a fixed volume of air within a certain period of time, and determine the cleanliness of the entire working environment through the number of particles detected.

Not long after turning on the instrument, the young man named Xiao Li's expression changed from frowning, to surprise, and finally to shock.

Director, the environmental cleanliness has exceeded Level 1! Xiao Li swallowed, his voice trembling a little.

It would be okay if it was only Level 1 cleanliness, because such environmental standards can be seen in many hospitals' sterile operating rooms and semiconductor factories.

What is Level 1 cleanliness?

That is, in 1 cubic meter of space, no more than 10 particles with a diameter of 0.1 microns are floating!

According to current international standards, cleanliness levels are divided into 9 levels. The number and diameter of particles at each level gradually decrease, and level 1 cleanliness is the highest set of standards in the entire industry.

This level of cleanliness has reached the point where it is almost sterile and dust-free.

However, according to the LCD screen display on the instrument, not even a single particle was detected in the air of this underground fortification.

Even the top foreign chip manufacturers cannot achieve such horrific air quality.

Because wherever people come in and out, suspended particles are easily brought in, from water molecules brought out from the mouth and nose to dust, to bacteria, fungi, etc. attached to the surface of the human body.

In order to deal with the spread of man-made particles, major chip manufacturers will set up several layers of cleaning checkpoints at the entrances and exits of their factories.

From electrostatic dust removal to a complete set of protective clothing, every staff member who comes into contact with the lithography machine is fully armed and wrapped like an astronaut going to outer space. The purpose is to prevent contamination of the working environment of the lithography machine.

However, this set of protective measures, which was comparable to a natural moat, was like a decoration in Chen Jue's hands, creating a higher-level clean environment with a wave of his hand.

Because the electric light emerging from his fingertips not only absorbs and removes dust and suspended solids in the air, but also water molecules, bacteria, and viruses that are invisible to the naked eye are instantly broken down by the strong electric field and transformed into The atomic form was sucked into the walls and the ground.

With the powerful [Matter Interference] skill, as long as Chen Jue is willing, all the materials in this underground fortification can be shattered into atoms, let alone these particles with a diameter of microns.

Can't even detect a single particle?

Even AMSL's core laboratory cannot achieve such a level of cleanliness! The group of researchers at the Institute of Optoelectronics discussed incessantly.

Lin Weiguo and others were naturally shocked to see such a huge and exaggerated change. They stared at the long series of zero numbers on the testing instrument without saying a word.

Coupled with the fully surrounding epoxy anti-static coating that Chen Hao had just rubbed by hand, this underground fortification that was originally backward and full of dust was transformed into the world's top clean room in the blink of an eye. .

Such an ability can no longer be explained by common sense, and has completely exceeded the understanding of existing science and technology.

…

After solving the environmental problems in the production of photolithography machines, Chen Jue felt the fiery looks from Lin Weiguo and others.

Without explaining too much, he stepped forward and opened several huge material containers in front of him, which contained various raw materials for manufacturing photolithography machines.

From special high-voltage transmission cables to extremely precise laser lenses, there are also several 3D printing machines used to manufacture photolithography machine parts.

After receiving the notice from the superiors, the Institute of Optoelectronics took out almost all the good things in hand. Many of the materials were laboratory confidentiality level. Just taking out any one item would be enough to apply for a patent protection on the market.

Of course, it is not that easy to create a photolithography machine with atomic-level precision.

You know, even the current ASML company only has a photolithography accuracy of 2.5 nanometers. Atomic-level accuracy is equivalent to a 25-fold improvement based on ASML's existing accuracy.

According to Moore's Law in the integrated circuit industry, it will take at least 18 to 24 months to double the accuracy of the semiconductor industry.

To improve the accuracy by 25 times on the original basis, it would take half a century if it were developed by a company like ASML.

The technical gap here can no longer be simply measured by time. If you want to achieve overtaking in corners, only someone like Chen Jue can do it!

…

Looking at the mountains of materials in front of him, Chen Jue first touched his chin and fell into brief contemplation. Then he retrieved several lithography machine design drawings sent by Optoelectronics from his smart watch.

You must know that the operating principle of a photolithography machine is nothing more than to illuminate a light source with a shorter wavelength on a wafer coated with photoresist to form a series of small transistor circuits.

The core element in the lithography machine is the laser light source. The shorter the wavelength of the light source emitted by the laser, the higher the accuracy of the final chip.

As for the most advanced laser lenses on the market, it is not the well-known ASML company, but two companies: Nikon and Canon.

I have to mention here that at the end of the last century, the semiconductor industry was so powerful that it was known as the semiconductor empire. It once occupied 80% of the world's share in the memory and chip fields.

At that time, in the field of photolithography machine manufacturing, what happened to the ASML company in the windmill country? This guy is completely transparent and cannot even be ranked in the semiconductor field!

The entire semiconductor industry is supported by Nikon and Canon. It is not an exaggeration to say that they are two heroes competing for father.

But after a lot of fighting, this dad really came.

This dad is none other than Eagle Country on the other side of the ocean!

When Yingguo saw that Nikon and Canon were competing in the field of photolithography machines, he immediately persuaded them to make peace: You two, stop fighting. Dad is here.

Then a set of ancestral boxing techniques, the Eagle Style Fighting Fist, came forward, directly issuing anti-dumping fines to the two companies and opening up core patented technologies. Incidentally, they also issued a 100% tariff fine to the entire semiconductor industry.

After such a popular combination of punches was carried out, it directly wiped out half of the chip industry of Tiaopanji.

After entering the 21st century, with the upgrade of semiconductor manufacturing technology, major manufacturers have increasingly higher requirements for the accuracy of photolithography machines.

Nikon and Canon, which were only half-lived after being beaten by an eagle, have been stuck at 193 nanometer precision because of insufficient technical reserves and a lack of innovation.

Because the photolithography machines manufactured by Nikon and Canon are traditional dry photolithography machines, they are limited by Moore's Law. If you want to improve the photolithography accuracy, you can only continue to polish the laser lenses.

But when it comes to precision machining, progress becomes slower the further you go.

After several years of work, Bay Semiconductor Manufacturing Co., Ltd. came up with a clever solution: at the moment when the laser is emitted, water droplets are used for refraction to shorten the wavelength of the laser.

When Nikon and Canon engineers first heard about this plan, they thought it was nonsense.

After all, the lithography machine is a very precise instrument. After filling it with water, no one can guarantee whether the lithography machine can continue to operate, so this solution was not adopted.

Coincidentally, the ASML company in Windmill Country found a treasure as soon as it heard about this plan, and convened a group of engineers to tinker with what would become the famous immersion lithography machine.

Of course, Yingguo also provided core technology for ASML, and convened national laboratories from several countries to participate in the research and development of immersion lithography machines. This is how extreme ultraviolet light, commonly known as EUA light, came about. The birth of the photolithography machine.

What Chen Juexian is currently struggling with is: Should we use a traditional dry lithography machine or a clever immersion lithography machine?

Fortunately, this tangle only lasted for half a minute. After browsing the design plans provided by Optoelectronics, Chen Jue muttered: A bird in the hand is better than a hundred birds in the bush!

The principle of using the dry type directly is simpler, and it is more difficult to be copied.

After saying that, Chen Jue opened his fingers, and the golden light emitted from his fingertips was like a chain, covering several large supply boxes in front of him.

With the high-power input of plasma energy and the ability of [Matter Interference], those originally cold cables, lenses, metals, rubber and other materials seemed to come alive, like pieces of Lego bricks, starting to follow Chen's rules. The ideas put together a pure white rectangular parallelepiped photolithography machine.

The prototype of the lithography machine was based on the design plan of the Institute of Optoelectronics, but for the sake of safety, Chen Jue strengthened the stability of the internal power supply system.

At the core laser component of the lithography machine, an ultra-micro laser lens that is so small that even an ordinary electron microscope is difficult to see is being constructed bit by bit under the interference of golden energy.

First update today~ I was delayed by something in the past two days.