Ultra-Dimensional Technology Era
Page 47
Facing the impeccable thinking network, competitors are also very helpless.
Chapter 42 Ambition
A day of relaxation.
Huang Mingzhe received Ma Zhili's report on the fourth day of the Lunar New Year, and he hurried to the Materials Research Institute.
"President, you are finally here." Ma Zhili said excitedly while walking.
Looking at the bloodshot eyes and messy hair of Ma Zhili and others, we know that they have been testing the law model of photosensitive materials these days.
"Lao Ma wants to combine work and rest, let's talk in the office!" Huang Mingzhe went to the office.
"Thank you, President, for your concern. I'm just too excited for a while."
In the office, only Ma Zhili and four researchers were present, and the others had not returned to work.
"Sit down." After Huang Mingzhe sat down, "The output efficiency calculated by the model is about 8.6%, and the qualified rate is about 1.7%."
"Yes, President." Ma Zhili said excitedly: "President, the calculation model you developed is too powerful, it is simply an artifact of material research and development."
"Everything in the universe is in mathematics, and there is nothing that cannot be calculated." Huang Mingzhe said with a smile.
If someone said this in front of Ma Zhili and others before, they would definitely scoff, but now they already believe it.
"President, if your model is released, it may trigger a revolution in materials science." Ma Zhili praised.
Huang Mingzhe shook his head and said: "This kind of international spirit is not good. We can use this model internally."
"The president is right."
"I read your report, and now I have the next task for you."
"President, please tell me." Ma Zhili quickly took out his notebook and said.
"Development of an X-ray hypersensitive adhesive."
"The president of X-ray high-sensitivity adhesive wants to develop photoresist!" Ma Zhili knew Huang Mingzhe's plan when he heard it.
Huang Mingzhe nodded: "That's right, it's X-ray photoresist. I have a few requirements. The wavelength should be between 3 and 8 nanometers; the X-ray sensitivity should be high enough, preferably within a few seconds. In addition, for the energy level of X-rays, it is best to achieve rapid photolysis without high energy levels."
"President, if we develop X-ray photoresist, there will be no customers for this." Ma Zhili reminded.
The light sources of lithography machines currently on the market are generally divided into ultraviolet light (UV), deep ultraviolet light (DUV), and extreme ultraviolet light (EUV). The most advanced lithography machine is ASML in the Netherlands. Produces extreme ultraviolet light (EUV), with a wavelength of 13.4 nanometers.
But in fact, in the 80s of the last century, in the lithography machine industry, there was another route besides the extreme ultraviolet (EUV) route-X-ray lithography machine.
Why X-ray lithography machines with wavelengths below 10 nanometers were finally eliminated by extreme ultraviolet light (EUV)
There are two reasons, one is the efficiency problem, the lithography speed of the photoresist under X-ray irradiation is relatively slow; the other is the accuracy problem, why is the X-ray with a wavelength below 10 nanometers, the lithography accuracy is poor because the mask cannot do it Below 10 nanometers.
The mask is the mother board of the circuit diagram. The reason why the extreme ultraviolet light (EUV) has high precision is that the ultraviolet light can use a convex lens to narrow the light coming from the mask, and everyone knows that X-rays have very strong penetrating power, and the convex lens is fundamentally Unable to focus.
So the X-ray lithography machine was eliminated.
There is no X-ray lithography machine on the market, which means that there are no customers.
"This question is not a question."
"If the president has no customers..."
Huang Mingzhe interrupted Ma Zhili: "Do you know why the X-ray lithography machine was eliminated?"
Ma Zhili nodded.
"The problem of efficiency lies in the photosensitivity of photoresist. If we develop an X-ray photoresist that can complete photolithography in a few seconds, is efficiency still a problem?" Huang Mingzhe asked rhetorically.
"Hmm" Ma Zhili was taken aback.
Indeed, as Huang Mingzhe said, the problem of photolithography efficiency is actually the influence of photoresist photosensitivity. In the final analysis, it is the problem of materials, and the problem of materials is not exactly the strength of Thinking Society
"As for the convex lens that cannot focus X-rays, why don't we make a convex lens that can focus X-rays? This is also the photosensitivity of the convex lens material, and the material can change everything." Huang Mingzhe reminded with a smile.
"That's right! Why didn't I think of that?" Ma Zhili's eyes widened immediately.
Others immediately became short of breath. If they solved the photosensitivity of photoresist and convex lens, wouldn't it be equivalent to completing the shortcomings of the X-ray lithography machine?
The inherent advantages of X-ray lithography machines are low divergence, concentrated light, and short wavelengths.
"If we want to complete an independent lithography machine system, we can't follow the old path of Westerners step by step, otherwise we will never be able to surpass each other." Huang Mingzhe said.
This problem is actually a stumbling block to the development of the domestic lithography machine industry. Following the Western route, how can other people's patents be bypassed?
In addition, the market for lithography machines is very small. There are only so many chip manufacturers around the world. The relationship between ASML and these chip manufacturers is inextricably linked. Even if it is manufactured, it may not be sold.
"President, we will arrange the material calculation immediately, and we must get the X-ray photoresist and X-ray convex lens." Ma Zhili said firmly.
"Pay attention to rest, the body is the capital of revolution." Huang Mingzhe said with concern.
"Thank you, President, for your concern. I will definitely pay attention."
"Old Ma, in addition, you must keep it secret. This matter is related to the right to speak in an industry, so don't be careless." Huang Mingzhe finally reminded.
"I must pay attention." Ma Zhili's face suddenly became serious.
……
Huang Mingzhe then called Cai Zhixing over and told him to prepare for relevant work and acquire X-ray light source manufacturing companies, optical lens manufacturing companies, and other lithography-related companies in China.
The Computer Programming Research Institute of Thinking Club itself has very strong software capabilities. After all, Huang Mingzhe independently completed the existence of the elementary artificial intelligence ghost.
The previous simulation space technology and finite element inverse analysis technology can also help the design of lithography machines.
Although Sisishe can't buy ASML's extreme ultraviolet (EUV) lithography machines, there are low-end lithography machines from Shanghai Microelectronics.
Buy a low-end lithography machine and come back, and then use finite element inverse analysis to complete the integration of various systems of the lithography machine, and then upgrade and upgrade step by step. The parts that can be purchased in China do not need to be manufactured, and the parts that are not available in China need to be manufactured by themselves.
2 month 16 day.
Another subsidiary of Sisishe was quietly established in Shanmei City, named Shenguang Instrument Company. This company was established very low-key.
And Huang Mingzhe dedicated his own account and allocated 4 million yuan as initial development funds.
As for the Materials Research Institute, despite the assistance of regular models, the research and development of materials is not so easy.
He has also been in the Materials Research Institute. As the researchers of the Institute resume work one after another, the progress of various tasks is speeding up.
"Old Ma, if you don't have enough staff, you can tell Manager Cai to ask him to recruit more people."
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