If you cheat, money will follow

Chapter 422 EUV is more difficult

The three of them came to Zhangjiang Development Zone, walked into the SMEE R&D building, and came to a huge workshop.

Good guy.

In such a large workshop, a huge piece of equipment takes up most of the space.

Looking at the density of circuits and components is mind-numbing.

"Boss, this is the DuvArfi lithography machine we developed. Not surprisingly, it should be the highest level in the country." He Rongming introduced with a slightly proud tone:

"From the double worktable, light source system, exposure system to objective lens system, grating system... every component is domestically produced."

Eight years ago, He Rongming would not have dared to think about it.

This is the magic of proper capital.

"Even if it's just a DUV lithography machine, it is the only country in the world that can independently manufacture it." Liang Qingsong said.

His expression was one of pride.

"How much is the selling price?" Chang Le asked.

"We plan to purchase one unit for US$3000 million," He Rongming said.

Well, ASML’s DUV lithography machines have different models and different prices.

The DUV price range is from 2000 million euros to 6500 euros.

Among them, one similar to the domestic DUV is priced at US$6500 million.

"This is a very competitive price." Chang Le nodded.

"Yes, because all products are made in China, our costs can be kept very low." He Rongming said.

After a while, many people came to the workshop.

These people are heads of parts companies and scientific research institutions.

He Rongming introduced them to Chang Le one by one.

Chang Le shook hands with these people one by one.

Among these companies are Huazhuo Jingke, which provides dual workpiece tables;

There is Keyi Hongyuan, which provides light sources;

Guoke Precision provides exposure systems;

There are Kaier Electrical and Mechanical, which provides immersion systems;

Guowang Optics provides objective lenses;

There is the Shanghai Institute of Optoelectronics, which provides grating systems;

There is also Nanda Optoelectronics, which provides photoresist;

Watt Gas provides photolithography gases;

China Resources Film provides photomasks;

Dongfang Jingyuan provides defect detection systems;

Also, Xinyuan Micro provides glue development.

It is the vigorous research and development of these companies that can ensure the successful development of Duv immersion lithography machines.

Smee, like ASML, is a system assembler.

Core technology focuses on equipment portfolio rather than equipment research and development.

After the introduction and getting to know each other, everyone came to the conference room together.

Sitting down one by one, Chang Le said:

“First of all, I want to thank you all for your tireless efforts and hard work over the past eight years.”

"Because of your hard work and mutual help, domestic lithography machines were able to achieve a triple jump from Krf lithography to ArFi lithography in such a short period of time, making a historic breakthrough."

"But now is not the time for us to celebrate."

"New challenges are just around the corner. Standing at a critical crossroads of technology iteration, we still need to determine our next step and start again."

applause!

After Chang Le said these words, he asked He Rongming: "Mr. He, what is the current progress of Asml's EUV lithography machine?"

"As far as we know, the development of the prototype should have been completed, but it will take time before it is actually launched for commercial use. The specific time is uncertain." He Rongming said.

"So, the gap between us and Asml is not big?" Chang Le continued to ask.

"Well... looking at the products alone, the gap is really not big, and we even have an advantage." He Rongming explained:

“But from the perspective of technology and product accumulation, we still have a long way to go.”

"Because they have been developing Euv for 22 years, they will inevitably encounter problems that we can't even imagine. We will all encounter these problems in the future."

"Yes." Chang Le nodded and continued to ask: "Mr. He, what is the difficulty in crossing from Duv to Euv?"

"There are many difficulties. The light source, objective lens, workbench, etc. are all very critical links." He Rongming said:

"Boss, how about this, let the person in charge of the company here introduce it? There are specialties in the industry, they are more professional, and it is easier to explain clearly."

"Okay." Chang Le nodded.

Therefore, the person in charge of Kaier Motor spoke first:

"Mr. Chang, Mr. He, let me talk first."

"it is good."

"First of all, I would like to thank Mr. Chang and Mr. He for their concern and support for Kaier Electric over the years. Without SMEE's financial support and help, Kaier Electric would not have been able to reach the eve of listing."

"When will it be launched?" Chang Le asked.

"October."

"Then the stocks we bought before will be worth more."

"Ha ha……"

After laughing briefly, the person in charge of Kaier Motor began to formally introduce the situation:

"Kier Electric mainly provides immersion systems for DuvArFi lithography."

"Through the immersion system and the folding effect of light, the equivalent wavelength of 193 nanometers to 134 nanometers is achieved, and it is possible to advance Arf lithography to Arfi lithography."

The immersion system immerses the space between the lens and the silicon wafer in a special liquid.

Since the refractive index of the liquid is greater than 1, the 193-nanometer wavelength light source can be shortened to 134 nanometers, thereby achieving higher resolution.

By the way, the lithography process node has been advanced from 45 nanometers to 14 nanometers and 10 nanometers.

"But..." the person in charge changed the subject:

"With the same method, the wavelength cannot be reduced after superimposing the 157-nanometer wave light source with immersion technology."

"So, entering the EUV stage, more complex technologies and means are needed to realize extreme ultraviolet light sources."

After the introduction by the person in charge of Qier Electric, the person in charge of Keyi Hongyuan Enterprise continued:

"Yes, entering the EUV research and development stage, the current mainstream method is to use an excimer laser to irradiate the solder ball target to obtain the extreme ultraviolet light source."

"To achieve this step, it takes time and is not easy."

How difficult is it?

Very big.

To generate an extreme ultraviolet light source with a wavelength of 13.5 nanometers, a high-power excimer exciter is required to continuously hit a small solder ball that is moving at high speed at a frequency of 5 times per second.

Let the temperature of the small solder ball rise to 50 degrees and turn into plasma, thereby producing extreme ultraviolet light.

The size of this small tin ball is one-thirty-millionth of a meter, and it moves at a speed of 321 kilometers per hour.

"Currently, there is only one company in the world that can provide this kind of laser, Germany's TRUMPF."

"But TRUMPF cannot provide it independently and requires cooperation and technical authorization from North American Cymer."

"In addition, a Lithuanian company is needed to provide key equipment. Behind this Lithuanian company is a North American technology license..."

“So, in terms of technology, we don’t get any reference or support. We still need to find ways to bypass patent restrictions and slowly explore.”

Light sources are just one of the key difficulties.

The person in charge of Guowang Optical continued:

"We are responsible for the research and development of the objective lens system, but it also takes time to explore and accumulate."

Euv objective lenses need to be absolutely smooth and flat in theory.

Lens fluctuations allow only one atom of error.

This is the limit of theoretical physics.

In layman's terms, it means enlarging the lens to the size of Lu Province.

A virus falls on the lens like a mountain rising from the ground.

After the person in charge of Guowang Optical said, the person in charge of Huazhuo Jingke said confidently:

"Our company is responsible for the workbench and is focusing on tackling the problem. We should be able to achieve the set goals and requirements in the near future."

What is the workbench for?

Equivalent to a carving knife.

On a silicon chip the size of a fingernail, tens of billions of transistors are carved.

This requires extremely high precision.

Of course, no country in the world can produce it independently.

It requires patent support and technical collaboration from Japan, South Korea, North America, Germany and many other countries.

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