Super Dimension Technology Era

Had a relaxing day.

Huang Mingzhe received Ma Zhili's report on the fourth day of the new year, and he hurried to the Materials Research Institute.

"President, you are finally here." Ma Zhili said excitedly as he walked.

Looking at the bloodshot eyes and messy hair of Ma Zhili and others, one can tell that they have been testing the photosensitive material pattern model these days.

"I want to balance work and rest, let's talk in the office!" Huang Mingzhe went to the office.

"Thank you, President, for your concern. I was just too excited for a while."

In the office, only Ma Zhili and four researchers were present, and the others had not returned to work yet.

"Everyone has a seat." After Huang Mingzhe sat down, he said: "The material production efficiency calculated by the model is about 8.6%, and the material production pass rate is about 1.7%."

"Yes, President." Ma Zhili said excitedly: "President, the calculation model you developed is so powerful, it is simply an artifact of materials research and development."

"Everything in the universe is in mathematics, and nothing cannot be calculated." Huang Mingzhe said with a smile.

If someone had said this in front of Ma Zhili and others before, they would have definitely scoffed, but now they somewhat believe it.

"President, if this model of yours is distributed, it will probably trigger a revolution in materials science." Ma Zhili admired.

Huang Mingzhe shook his head and said: "This kind of international spirit is unacceptable. We can just use this model internally."

"The president is right."

"I read your report, now I give you the next task."

"President, please give me your instructions." Ma Zhili quickly took out his notebook and said.

"Develop an X-ray highly sensitive glue."

"X-ray high-sensitivity glue? The president wants to develop photoresist, right?" Ma Zhili knew Huang Mingzhe's plan as soon as he heard it.

Huang Mingzhe nodded: "That's right, it's X-ray level photoresist. Let me make a few requirements. The wavelength should be between 3 and 8 nanometers; the X-ray sensitivity should be high enough, preferably within a few seconds. Complete dissolution within 10 seconds; in addition, for the energy level of X-rays, it is best to achieve rapid photodecomposition without high energy levels."

"President, if we develop X-ray photoresist, there will be no customers for this." Ma Zhili reminded.

The light sources of lithography machines currently on the market are generally divided into ultraviolet (UV), deep ultraviolet (DUV), and extreme ultraviolet (EUV). The most advanced lithography machine is ASML in the Netherlands. The extreme ultraviolet light (EUV) produced has a wavelength of 13.4 nanometers.

But in fact, in the 1980s, in the lithography machine industry, in addition to the extreme ultraviolet (EUV) route, there was another route - X-ray lithography machine.

Why were X-ray lithography machines with wavelengths below 10 nanometers eventually eliminated by extreme ultraviolet (EUV)?

There are two reasons. One is the efficiency issue. The photolithography speed of the photoresist under X-ray irradiation is relatively slow. The other is the accuracy issue. Why is it said that X-rays with wavelengths below 10 nanometers have poor photolithography accuracy? Because the mask cannot be made. to below 10 nanometers.

The mask is the motherboard of the circuit diagram. The reason why extreme ultraviolet light (EUV) has high accuracy is that ultraviolet light can use convex lenses to reduce the light coming from the mask, and everyone knows that the penetrating power of X-rays is very strong, and convex lenses cannot Unable to focus.

So the X-ray lithography machine was eliminated.

There are no X-ray lithography machines on the market, which means there are no customers.

"This question is not a problem."

"If the president has no customers..."

Huang Mingzhe interrupted Ma Zhili: "Do you know why the X-ray lithography machine was eliminated?"

Ma Zhili nodded.

"The efficiency problem lies in the photosensitivity of the photoresist. If we develop an X-ray photoresist that can complete photolithography in a few seconds, will efficiency still be a problem?" Huang Mingzhe asked rhetorically.

"Huh?" Ma Zhili was stunned.

Indeed, as Huang Mingzhe said, the problem of photolithography efficiency is actually the impact of the photosensitivity of the photoresist. In the final analysis, it is a material problem, and isn’t the material problem exactly the strength of Sisi Society?

"As for the convex lens that cannot focus X-rays, why don't we make a convex lens that can focus X-rays. This is also the photosensitivity of the convex lens material. The material can change everything." Huang Mingzhe reminded with a smile.

"That's right! Why didn't I think of that?" Ma Zhili's eyes suddenly widened.

Others suddenly began to breathe quickly. If they solved the photosensitivity of the photoresist and convex lens, wouldn't it be equivalent to completing the shortcomings of the X-ray lithography machine?

The inherent advantages of X-ray lithography machines are low divergence, concentrated light, and short and powerful wavelengths.

"If we want to complete an independent lithography machine system, we cannot follow the old path of Westerners step by step, otherwise we will never be able to surpass each other." Huang Mingzhe said.

This problem is actually a roadblock to the development of the domestic lithography machine industry. If we follow the Western route, how can we get around other people's patents?

In addition, the market for lithography machines is very small. There are so many chip manufacturing companies around the world. ASML is closely related to these chip manufacturing companies. Even if it is built, it probably won’t be sold.

"President, we will arrange material calculations immediately and we will definitely get the X-ray photoresist and X-ray convex lens." Ma Zhili said firmly.

"Pay attention to rest, the body is the capital of revolution." Huang Mingzhe said with concern.

"Thank you, President, for your concern. I will definitely pay attention."

"Lao Ma, you must also keep it confidential. This matter is related to the right to speak in an industry, so you can't be careless." Huang Mingzhe finally reminded.

"I will definitely pay attention." Ma Zhili's face suddenly became serious.

…

Huang Mingzhe then called Cai Zhixing over and told him to prepare for relevant work and acquire domestic X-ray light source manufacturing companies, optical lens manufacturing companies and other lithography machine-related companies.

The Computer Programming Research Institute of Think Society itself has very strong software capabilities. After all, Huang Mingzhe independently completed the existence of the primary artificial intelligence ghost.

The previous simulation space technology and finite element inverse analysis technology can also assist in the design of lithography machines.

Although Sisi She cannot buy ASML's extreme ultraviolet (EUV) lithography machines, Shanghai Microelectronics' low-end lithography machines are available.

Buy a low-end lithography machine, and then use finite element inverse analysis to first integrate the various systems of the lithography machine, and then upgrade and transform it step by step. You don't need to make parts that can be purchased domestically, and you can find ways to make them yourself if you don't have them domestically.

February 16th.

Another subsidiary of Sisishe was quietly established in Shanmei City. Its name is Shenguang Instrument Company. This company was established in a very low-key manner.

Huang Mingzhe will allocate 400 million from his own account as initial development funds.

As for materials research institutes, despite the assistance of regular models, materials research and development work is not that easy.

He has also been working at the Institute of Materials. As researchers at the institute resume work one after another, the progress of various tasks is accelerating.

"Lao Ma, if you don't have enough staff, you can tell Manager Cai and ask him to recruit more people."

"I'll sort it out tonight and make a list of gaps." Ma Zhili admired Huang Mingzhe to the extreme.

In addition to the photosensitive material law model, Huang Mingzhe has also completed the elastic material law model and the capacitive material law model these days.

These two regular models have many applications for future materials science research.

Needless to say, elastic materials. In layman’s terms, capacitive materials are electrical energy storage materials, similar to batteries.

After explaining some things, Huang Mingzhe set off on his way to school.

Thanks to the book friend "Half Pot Xiaodao" for the reward

Thank you all for your continued support! (ω｀)